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RT Book, Whole SR Print DC OPAC T1 Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California / Philliip D. Blais, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics T2 Proceedings / SPIE -- the International Society for Optical Engineering A1 Blais, Phillip D. A1 International Society for Hybrid Microelectronics YR 1985 FD c1985 VO pbk. SP vi, 219 p. K1 Lithography, Electron beam -- Congresses K1 X-ray lithography -- Congresses K1 Ion beam lithography -- Congresses PB SPIE--the International Society for Optical Engineering PP Bellingham, Wash., USA SN 089252572X LA English (英語) CL LCC:TK7874 CL DC19:621.3815/2 NO Includes bibliographies and index NO 書誌ID=2000062464; NCID=BA00226980; LK [OPAC]https://www.lib.ntu.ac.jp/opac/opac_link/bibid/2000062464 OL 30