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検索キーワード:(件名: #Semiconductor doping)
該当件数:5件
Impurity doping processes in silicon / edited by F.F.Y. Wang
Amsterdam ; New York : North-Holland Pub. Co.. - New York, N.Y. : Sole distributors for the USA and Canada, Elsevier North-Holland , c1981. - (Materials processing, theory and practices ; v. 2)
図書
Ion implantation techniques : lectures given at the Ion Implantation School, in connection with the Fourth International Conference on Ion Implantation: Equipment and Techniques, Berchtesgaden, Fed. Rep. of Germany, September 13-15, 1982 / editors, H. Ryssel and H. Glawischnig
: us,: gw. - Berlin ; New York : Springer-Verlag , 1982. - (Springer series in electrophysics ; v. 10)
Advanced applications of ion implantation : January 23-25, 1985, Los Angeles, California / Michael I. Current, Devendra K. Sadana, chairmen/editors
pbk.. - Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering , c1985. - (Proceedings / SPIE -- the International Society for Optical Engineering ; v. 530)
Rapid thermal processing of electronic materials : symposium held April 21-23, 1987, Anaheim California, U.S.A. / editors, Syd R. Wilson, Ronald Powell, D. Eirug Davies
Pittsburgh, Pa. : Materials Research Society , c1987. - (Materials Research Society symposia proceedings ; v. 92)
Ion implantation technology : proceedings of the Seventh International Conference on Ion Implantation Technology, Kyoto, Japan, June 7-10, 1988 / edited under the responsibility of T. Takagi ... [et al.]
Amsterdam : North-Holland , 1989. - (Nuclear instruments & methods in physics research ; Section B. Beam interactions with materials and atoms ; v.37-38)